Spatial ALD
Description
Space atomic layer deposition (SALD) is an alternative to conventional atomic layer deposition (ALD) in which precursors are continuously injected into different reactor locations, separated by a flow of inert gas. As a result, SALD is up to orders of magnitude faster than conventional ALD, achieving deposition rates more typical of CVD. In addition, SALD can easily be carried out at atmospheric pressure and even in the open air, that is to say without the need for a deposition chamber. At the same time, the unique strengths of ALD, namely, nanometer thickness control, high compliance and high-quality material deposition at low temperatures (from room temperature to 300 °C), are maintained. At LMGP, we work with the proximity approach based on a distribution head. In addition, the platform will allow combinatorial deposition (thickness, composition, crystallinity, etc.).
D. Muñoz-Rojas and J. MacManus-Driscoll
Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics,
Materials Horizons, 2014, 1, 314
DOI: 10.1039/C3MH00136A
Location
LMGP, Grenoble.
Contacts
Responsible of the platform: David MUNOZ-ROJAS
Associated targeted project coordinator: Yann LECONTE
Technical characteristics
Thin layer deposition system allowing the preparation of combinatorial layers of oxides from a few nanometers to a few microns thick, on surfaces of the order of 5 cm2.
Deposition temperature from room temperature to 300°C.
Associated targeted project
