PVD TriProS Reactor
Description
The PVD TriProS reactor is an industrial system for thin film deposition using highly ionized plasmas (HiPIMS; High-power Impulse Magnetron Sputtering, optional PVD-Arc). It is equipped with 4 large-sized sources and a 3-rotation substrate holder.
Location
UTT/LASMIS/Nogent Branch
Contacts
Platform Manager: : Frédéric SANCHETTE
Technical Specifications:
The TriProS 2 machine, originally named for its tri-process capabilities (HiPIMS, PECVD, and Cathodic ARC), is fully controlled with a user-friendly interface and based on a Pfeiffer Cubical 750 platform. For the PVD part, this equipment, which has 4 cathodes mounted in a closed field configuration, can operate in the following modes:
- DC-Pulse with an Advanced Energy Pinnacle Plus+ Dual generator (2x5kW),
- Unipolar HPPMS on up to 2 channels with 2 pulsers,
- Bipolar HPPMS on all four cathodes simultaneously, using pulsers.
The substrate holder is powered by a modified 5kW Pulser, which is mounted at 50kHz. This allows for the polarization of parts in frequency (or just DC), and also enables the generation of current spikes for working in HPPMS CVD.
There are 7 gas lines: Ar, N2, O2, H2, TMS, C6H12, and HMDS.
